DS1 spectrogram: Inverse Design of Realizable Metasurface based Absorbers using Improved Conditioning and Diversity Enhanced Progressively Growing GANs

Inverse Design of Realizable Metasurface based Absorbers using Improved Conditioning and Diversity Enhanced Progressively Growing GANs

2606.05849

Authors

Vineetha Joy,Mohammad Abdullah,Pramit Pal,Anshuman Kumar,Amit Sethi

Abstract

Metasurfaces enable precise manipulation of electromagnetic waves for applications such as beam steering, sensing, and stealth technology. However, inverse design of metasurfaces with targeted EM responses remains challenging due to the computational expense of iterative full wave simulation driven optimization and the limited conditioning fidelity and diversity of existing generative approaches.

To address these challenges, this paper presents a generative inverse design framework for controllable and physically consistent metasurface synthesis under continuous spectral constraints. The proposed approach employs a progressively growing Wasserstein generative adversarial network with gradient penalty integrated with feature wise linear modulation based conditioning for stable propagation of continuous spectral and fabrication constraints.

EM consistency is embedded directly into the generative learning process through a surrogate assisted spectral alignment loss, enabling physics constrained generation during training. Further, a determinantal point process based diversity regularization strategy is incorporated to generate geometrically diverse yet spectrally consistent realizations for the same target response.

The effectiveness of the proposed framework is demonstrated through the generation of practically realizable metasurface absorbers exhibiting diverse reflection characteristics in the frequency range of 2 to 18 GHz. EM simulations validate that the generated designs meet the target specifications with high accuracy.

The final proposed framework achieved an average mean squared error of 0.0052, diversity score of 0.8730, band alignment accuracy of 0.8533, and a valid EM design generation percentage of 89.57, clearly demonstrating its capability to generate highly accurate, diverse, electromagnetically consistent and fabrication realizable metasurface configurations.

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